NPGS  : Sample Pictures

Many Detailed Structures	Rose written in 1989	Hex Grid	45 Degree Box ~30 nm lines	Isolated Line ~12 nm width	Dose Matrix 1:1 Line/Space to ~14 nm
Free-Standing AuPd Film	Melted AuPd Film	Dammann Grating 800 x 800 microns	Fine AuPd Wires ~30 nm wide	Lines of 5nm Au Islands	MEMS* Devices
Free-Standing Al Structures	Filled Polygons*	Circular Grating	Circular Grating 0.15 um period	Crossed Carbon Nanotubes from 1999	RAM Device
Double Bend Point Contact	Split Gate Structure	Large Bonding Pads for Split Gate	Electroplated SAW Devices	Electron Pump AFM image	Multilayer Cu/Co Wire
Dartmouth Seal*	Logarithmic Spirals*	Air Bridge to Quantum Dot	Deeply Etched Optical Resonator	Magnetic Loops* (using cFE SEM)	USA Map
FIB Milling: 300 nm Dots	FIB Milling: DaVinci's Vitruvian Man	FIB Milling: Escher drawing	Electron Beam Induced Deposition (EBID)	Radial Dots* 0.3 um spacing

Diagnostic Images - A Guide to Common SEM Lithography Exposure Problems:

While the images shown above demonstrate very good results in the wide range of applications that NPGS has been used for, when first learning to do lithography, it can be more important to know the cause of common problems. Consequently, the following images are shown to help new users diagnose common exposure problems. By clicking an image below, you will obtain a discussion of the problem displayed and/or instructions on the recommended approach for doing SEM lithography.

Also see the general SEM Optimization Guide and the SEM Lithography Setup Guide.

Gold Standard *	Contamination Spots	Charging #1 during imaging	Charging #2 during writing	Lift-Off*	Line Frequency Noise
Wheel #1 ~20 nm lines	Wheel #2*	Wheel #3*	Wheel #4 AFM Image	Wheel #5 AFM Image	Wheel #6
Bad Magnification	Bad Coating	Small Dots	10 kV Wheel	Negative PMMA	Double Exposure