NPGS  : Sample Pictures


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Click the images below to see the full picture and a written summary. (Jump down to Diagnostic Images.)
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Many Detailed
Structures
Rose
written in 1989
Hex Grid

45 Degree Box
~30 nm lines
Free-Standing
AuPd Film
Melted AuPd
Film
Dammann Grating
800 x 800 microns
Fine AuPd Wires
~30 nm wide
Free-Standing Al
Structures
Filled Polygons*

Circular Grating

Circular Grating
0.15 um period
Double Bend
Point Contact
Split Gate
Structure
Large Bonding
Pads for Split
Gate
Electroplated
SAW Devices
RAM Device MEMS*
Devices
Radial Dots*
0.3 um spacing
Electron Pump
AFM image
Dartmouth Seal*

Logarithmic
Spirals*
Air Bridge to
Quantum Dot
Deeply Etched
Optical Resonator
USA Map

Lines of 5nm
Au Islands
Crossed Carbon
Nanotubes
Multilayer
Cu/Co Wire
Magnetic Loops*
(using cFE SEM)
Line from a
thermal FE SEM

FIB Milling:
DaVinci's
Vitruvian Man
FIB Milling:
Escher drawing


Diagnostic Images - A Guide to Common SEM Lithography Exposure Problems:

While the images shown above demonstrate very good results in the wide range of applications that NPGS has been used for, when first learning to do lithography, it can be more important to know the cause of common problems. Consequently, the following images are shown to help new users diagnose common exposure problems. By clicking an image below, you will obtain a discussion of the problem displayed and/or instructions on the recommended approach for doing SEM lithography.

Also see the general SEM Optimization Guide and the SEM Lithography Setup Guide.


Gold Standard *

Contamination
Spots

Wheel #1
~20 nm lines
Wheel #2*
Wheel #3*

Wheel #4
AFM Image
Wheel #5
AFM Image
Wheel #6

Charging #1
during imaging
Charging #2
during writing
Lift-Off*

Small Dots

Bad
Magnification
Bad Coating

Line Frequency
Noise
10 kV Wheel

Negative PMMA

Double Exposure


* Image was acquired using the NPGS Digital Imaging Feature.
All images on this site are Copyright (c) by JC Nabity Lithography Systems unless otherwise noted. Permission to display these images for non-commercial uses will be given if a request is made in writing before such use and if proper reference to JC Nabity Lithography Systems is displayed with the image(s).
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