NPGS  : Sample Pictures

Many Detailed Structures	Rose written in 1989	Hex Grid	45 Degree Box ~30 nm lines
Free-Standing AuPd Film	Melted AuPd Film	Dammann Grating 800 x 800 microns	Fine AuPd Wires ~30 nm wide
Free-Standing Al Structures	Filled Polygons*	Circular Grating	Circular Grating 0.15 um period
Double Bend Point Contact	Split Gate Structure	Large Bonding Pads for Split Gate	Electroplated SAW Devices
RAM Device	MEMS* Devices	Radial Dots* 0.3 um spacing	Electron Pump AFM image
Dartmouth Seal*	Logarithmic Spirals*	Air Bridge to Quantum Dot	Deeply Etched Optical Resonator
USA Map	Lines of 5nm Au Islands	Crossed Carbon Nanotubes	Multilayer Cu/Co Wire
Magnetic Loops* (using cFE SEM)	Line from a thermal FE SEM	FIB Milling: DaVinci's Vitruvian Man	FIB Milling: Escher drawing

Diagnostic Images - A Guide to Common SEM Lithography Exposure Problems:

While the images shown above demonstrate very good results in the wide range of applications that NPGS has been used for, when first learning to do lithography, it can be more important to know the cause of common problems. Consequently, the following images are shown to help new users diagnose common exposure problems. By clicking an image below, you will obtain a discussion of the problem displayed and/or instructions on the recommended approach for doing SEM lithography.

Also see the general SEM Optimization Guide and the SEM Lithography Setup Guide.

Gold Standard *	Contamination Spots	Wheel #1 ~20 nm lines	Wheel #2*
Wheel #3*	Wheel #4 AFM Image	Wheel #5 AFM Image	Wheel #6
Charging #1 during imaging	Charging #2 during writing	Lift-Off*	Small Dots
Bad Magnification	Bad Coating	Line Frequency Noise	10 kV Wheel
Negative PMMA	Double Exposure