NPGS  : 20 nm Pitch (with ~10 nm lines)


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This picture shows an SEM image of a linear grating with ~10 nm lines and a pitch of ~20 nm. The exposure was in ~30nm thick PMMA on a Si substrate where a relatively high dose was used to crosslink the PMMA, rather than using the PMMA as a conventional positive resist. After development, the sample was sputter coated with ~1nm of AuPd.

This work was done at the Optoelectronics Research Centre at the University of Southampton, UK.

Image Copyright © 2012, Optoelectronics Research Centre. Used by permission.