NPGS for SEM Lithography

Nanometer Pattern Generation System

NPGS is the top selling SEM lithography system at research institutions in North America, and its use is becoming widespread around the world. The objective for NPGS is to provide a powerful, versatile, and easy to use system for doing advanced beam or ion beam lithography using a commercial SEM, STEM, FIB, or dual beam (SEM/FIB) microscope. The success of NPGS at meeting this goal is demonstrated by the strong recommendations from current users.

You are invited to inspect the following links for additional information on NPGS, and you are encouraged to get any additional questions answered about NPGS, electron beam lithography (EBL), Ion Beam Lithography, or microscopes in general, by telephone or e-mail.

To learn more about NPGS and SEM lithography in general, please view the following pages:

Overview
Questions & Answers
System Description
Microscope Considerations
User List
Sample Pictures ...also see the Diagnostic Images.
Other Resources & Links
Book List
User Notices - The high speed NPGS v9.0 Upgrade for Windows 2000/XP is available to NPGS users with older systems.

For additional information, please contact:

Joe Nabity, Ph.D.
JC Nabity Lithography Systems
P.O. Box 5354
Bozeman, MT 59717 USA
Voice: (406) 587-0848
FAX: (406) 586-9514
E-mail: info@jcnabity.com
Web: www.jcnabity.com

New links or information added to the NPGS web site:

Example movies of FIB Milling with NPGS

Variable Pressure Lithography on Insulating Substrates
with NPGS and a VP SEM

User Notices: MentorNet
Be a Mentor / Get a Mentor through MentorNET.

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NPGS: The highest performance / lowest cost SEM Lithography System for over 15 years!

The last update of this site was on May 7, 2008.