<for Direct Write Lithography using a commercial Electron Beam or Ion Beam Microscope>
The Nanometer Pattern Generation System is the top selling SEM lithography
system at research institutions in North America and its use has become
widespread around the world. The objective for NPGS is to provide a
powerful, versatile, and easy to use system for doing advanced electron
beam lithography or ion beam lithography using a commercial SEM
(Scanning Electron Microscope), STEM (Scanning Transmission Electron Microscope),
FIB (Focused Ion Beam), dual beam (SEM/FIB), or Helium Ion microscope. The
success of NPGS at meeting this goal is demonstrated by the strong
recommendations from current users.
You are invited to inspect the following links for additional information
on NPGS, and you are encouraged to get any additional questions answered
about NPGS, electron beam lithography (EBL), Ion Beam Lithography, or microscopes
in general, by telephone or e-mail.
To learn more about NPGS and SEM lithography in general, please view the following pages:
For additional information, please contact:
New links or information added to the NPGS web site:
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NPGS: The highest performance / lowest cost direct write Lithography System for over 20 years!
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The last update of this site was on August 28, 2014.
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